Now providing TaO5 sputter rate standard

Why do you need sputter rate standards anyway? Each ion source will produce a different sputter rate depending on the conditions that the ion source is operated at, as well as other factors such as the angle of the ion source to the sample. Changing the beam voltage, condenser and focus (beam size), pressure (amount of argon or other gas) and raster area all affect the sputter rate. By using a sputter rate standard you can characterize your ion source for a particular set of operating conditions for a known oxide layer thickness of standard material (Ta2O5 or SiO2).

RBD Instruments  provides a 1000 Angstrom oxide layer SiO2 sputter rate standard which is approximately .50 X .50 inch in size and comes in a two pack.  The RBD part number is SIO2CALRE  and like the TaO5 standard, both sides can be used.